Three-dimensional micromachining of silicon using focused high-energy ion beams

ثبت نشده
چکیده

There are many techniques available for two-dimensional machining and patterning of semiconductor surfaces for optoelectronic and microelectronic applications. These mainly use photolithography, electron beam or X-ray lithography or reactive ion etching. Smooth surfaces and high-aspect ratio sidewalls can be produced, but they are all limited to creating a single etch depth per processing stage. Multiple depths of etching and inclined or curved surfaces require a sequence of repeated processes which is both complex and expensive.

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Focused ion beam induced deposition: fabrication of three-dimensional microstructures and Young’s modulus of the deposited material

In this work, some of the possibilities of focused ion beams for applications in microsystem technology are explored. Unlike most previous studies, the emphasis is on ‘additive’ techniques, i.e. localized maskless deposition of metals and insulators. More precisely, we will show the possibility of fabricating small three-dimensional structures, using focused ion beam deposition of silicon oxide...

متن کامل

APPLIED PHYSICS REVIEWS Ion beams in silicon processing and characterization

General trends in integrated circuit technology toward smaller device dimensions, lower thermal budgets, and simplified processing steps present severe physical and engineering challenges to ion implantation. These challenges, together with the need for physically based models at exceedingly small dimensions, are leading to a new level of understanding of fundamental defect science in Si. In th...

متن کامل

Sample preparation by focused ion beam micromachining for transmission electron microscopy imaging in front-view.

This article deals with the development of an original sample preparation method for transmission electron microscopy (TEM) using focused ion beam (FIB) micromachining. The described method rests on the use of a removable protective shield to prevent the damaging of the sample surface during the FIB lamellae micromachining. It enables the production of thin TEM specimens that are suitable for p...

متن کامل

Micromachining along a curve: Femtosecond laser micromachining of curved profiles in diamond and silicon using accelerating beams

We report femtosecond laser micromachining of micron-size curved structures using tailored accelerating beams. We report surface curvatures as small as 70 μm in both diamond and silicon, which demonstrates the wide applicability of the technique to materials that are optically transparent or opaque at the pump laser wavelength. We also report the machining of curved trenches in silicon. Our res...

متن کامل

Synthesis of Three - Dimensional Mesoporous Silicon from Rice Husk via SHS Route

Silicon nanoparticles are the focus of attention thanks to their potentialities in advanced applications such as new batteries, photovoltaic cells and so on. The need to porous silicon is thus rising and will follow the same trend. In this work, highly porous nanostructured silicon is synthesized via Self-propagating high-temperature synthesis (SHS) route. Microstructural and phase analyses sho...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2013